The CEF labs are at the forefront of emerging nanotechnology research. They offer state-of-the-art semiconductor characterisation facilities and enable a range of emerging nanoelectronics device and systems testing, novel semiconductor films characterisation and bioelectronic interface measurements. 1. Chip test instrumentation Data acquisition and interfacing equipment for general analogue/digital characterisation and testing of chips and devices. 2. PCB soldering and rework station The lab is equipped with a host of soldering equipment. Standard soldering irons are complemented by hot-air tools, hot plates, air extraction, a stock of components, and electronic testing equipment. 3. Network analysis The R&S ZNB40 VNA enhances the labs’ ability to develop high-speed RF PCBs and RF components. It has a frequency range up to 43.5 GHz and wide dynamic range of 140 dB. 4. Scanning Electron Microscopy with element analysis Fast-turnaround imaging at much higher magnification than standard optical microscopy with X-Ray element analysis for composition mapping across surfaces. 5. Keithley 4200 parameter analyzer The parameter analyzer is a Versatile multi-purpose electronic characterisation capability including I-V, C-V and ultra-fast pulsing. 6. Manual probe stations with RF and optical capabilities Two 150 mm probestations with coplanar GSG RF probes suitable for high frequency characterisation of chips and waveguides up to 40 GHz. The stations also support advanced optics for optical signal sourcing and acquisition. 7. Semi-automatic probestations Two state-of-art semi-automatic probestations (Cascade MicroTech Summit 12K and MPI TS200-IFE) support large-scale, high-precision, automated testing with accurate positioning of up to 200 mm wafers and over a temperature range of -60°C to 300°C in electrically and environmentally isolated microchambers. 8. Atomic Force Microscopy The Park NX20 offers a wide range of measurement capabilities for surface analysis for up to 6” wafers. It can do standard surface roughness and 3D structure measurements while offering additional modes for in-depth analysis. These include Kelvin Probe Microscopy, Conductive AFM Microscopy and Magnetic AFM modes all in an electrically isolated environment with a temperature range between -25C and 180C. 9. X-Ray Diffractometry X-Ray analysis with the Bruker D8 Discover for bulk and grazing incidence diffractometry, stress analysis and reflectometry. Equipped with a high-intensity X-ray source and both 1D and 2D detectors. 10. Confocal Imaging The Zeiss LSM confocal microscope is designed for imaging fluorescence of transparent or translucent samples on biological and chemically functionalised samples. It can produce image stacks for 3D visualisation and supports muti-wavelength excitation (487-594 nm). 11. Solution-based thin film manufacturing and characterisation Equipment for deposition of solution-processed materials via spin coating, as well as for depositing metals in high vacuum. The tool is also equipped with a probe station, allowing for the full manufacturing and characterisation of optoelectronics in a controlled environment. 12. Wet processing area A general wet chemistry environment for surface cleaning and modification of substrates. Services include nitrogen, CDA, ultrasonic cleaning, spin coating and hot plates. 13. Manual probe stations Modular, multi-purpose probe stations can be configured for unusual samples and process depending on the demands of the user while providing all the standard I-V/C-V characterisation tooling and either coax or guarded triax connections. Download our PDF brochure This article was published on 2025-06-23