The Institute for Integrated Micro and Nano Systems (IMNS) combines technology and chip design to address applications in biomedical, biomimetic, quantum, energy, advanced and neural computation.

Our researchers use micro and nano fabrication, micro and nano-electronics & photonics, integrated with bespoked circuits and system-on-chip designs to create smart micro- and nano-systems.

The R&D portfolio covers the complete spectrum of microelectronics, from design to fabrication. It includes the in-house capability to process foundry wafers to create novel systems that defy Moore's law of doubling semiconductors on chips, creating more-than-Moore solutions, and deploying those solutions in a broad range of applications.

Our next-generation technology has allowed our researchers to create innovative designs which have secured strategic capital investments. These assets include a maskless lithography tool, deep etch technology for silicon vias, wafer thinning equipment, resist spray coating units, atomic layer deposition machine, XPS/Raman surface analysis tool. Our research institute was the first facility in the United Kingdom to install the Heidelberg Nano (formerly SwissLitho) NanoFrazor Explore nanolithography tool. The recent acquisition will serve to open new avenues of research ideas and direction.